%0 Journal Article
%A Yorick Trouiller
%T From 120 to 32 nm CMOS technology: development of OPC and RET to rescue optical lithography
%J Comptes Rendus. Physique
%D 2006
%P 887-895
%V 7
%N 8
%I Elsevier
%R 10.1016/j.crhy.2006.10.001
%G en
%F CRPHYS_2006__7_8_887_0