TY  - JOUR
AU  - Yorick Trouiller
TI  - From 120 to 32 nm CMOS technology: development of OPC and RET to rescue optical lithography
JO  - Comptes Rendus. Physique
PY  - 2006
SP  - 887
EP  - 895
VL  - 7
IS  - 8
PB  - Elsevier
DO  - 10.1016/j.crhy.2006.10.001
LA  - en
ID  - CRPHYS_2006__7_8_887_0
ER  -