[Dépôt spatial par couche atomique : un outil émergeant pour les matériaux pour l'énergie. Application aux composants photovoltaïques de nouvelle génération et aux matériaux transparents et conducteurs]
Les propriétés des matériaux constituent la pierre angulaire des dispositifs fonctionnels pour l'énergie, et cela concerne aussi bien la conversion, la récupération ou le stockage d'énergie. De façon à concevoir et fabriquer des nouveaux matériaux pour l'énergie à l'échelle industrielle, il est nécessaire de développer des méthodes de dépôt appropriées et accessibles à des prix abordables. Au cours des dernières années, une nouvelle approche du dépôt par couche atomique (ALD) a suscité un intérêt croissant. Cette approche repose sur la séparation des précurseurs dans l'espace plutôt que dans le temps lors du dépôt par couches atomiques, et a donc été appelée Spatial ALD (SALD). La méthode SALD permet d'éviter les étapes de purge typiques de l'ALD, et, par conséquent, les taux de dépôt de couches sont bien plus rapides, jusqu'à deux ordres de grandeur. De plus, le dépôt par SALD peut être facilement effectué à l'atmosphère ambiante. La mise en œuvre du SALD est donc plus facile et moins coûteuse que celle de l'ALD conventionnelle, ouvrant ainsi la possibilité de son application industrielle au dépôt de matériaux pour l'énergie, et notamment à des domaines tels que l'énergie solaire, le stockage énergétique ou les fenêtres intelligentes. Nous présentons ici la description de la méthode de dépôt SALD et l'illustrons avec des exemples appliqués au photovoltaïque et aux matériaux conducteurs transparents. Nous montrons notamment que la SALD est capable de produire des couches minces de la même qualité que par ALD classique, et qu'elle est donc parfaitement adaptée pour une intégration à l'échelle industrielle.
Materials properties are the keystone of functional devices for energy including energy conversion, harvesting or storage. But to market new energy materials, the development of suitable processing methods allowing affordable prices is needed. Recently, a new approach to atomic layer deposition (ALD) has gained much momentum. This alternative approach is based on separating the precursors in space rather than in time, and has therefore been called Spatial ALD (SALD). With SALD, the purge steps typical of ALD are not needed and thus deposition rates a hundred times faster are achievable. Additionally, SALD can be easily performed at ambient atmosphere, thus it is easier and cheaper to scale up than conventional ALD. This opens the door to widespread industrial application of ALD for the deposition of energy materials for applications including solar energy, energy storage, or smart windows. SALD is presented here and examples of application to photovoltaics and transparent conductive materials are given. We show that SALD is capable of producing high-quality films fully suited for device integration.
Mot clés : Dépôt par couche atomique spatial, Couches minces, Matériau transparent conducteur, Dépôt conforme, Applications à l'énergie
David Muñoz-Rojas 1 ; Viet Huong Nguyen 1 ; César Masse de la Huerta 1 ; Sara Aghazadehchors 1 ; Carmen Jiménez 1 ; Daniel Bellet 1
@article{CRPHYS_2017__18_7-8_391_0,
author = {David Mu\~noz-Rojas and Viet Huong Nguyen and C\'esar Masse de la Huerta and Sara Aghazadehchors and Carmen Jim\'enez and Daniel Bellet},
title = {Spatial {Atomic} {Layer} {Deposition} {(SALD),} an emerging tool for energy materials. {Application} to new-generation photovoltaic devices and transparent conductive materials},
journal = {Comptes Rendus. Physique},
pages = {391--400},
publisher = {Elsevier},
volume = {18},
number = {7-8},
year = {2017},
doi = {10.1016/j.crhy.2017.09.004},
language = {en},
}
TY - JOUR AU - David Muñoz-Rojas AU - Viet Huong Nguyen AU - César Masse de la Huerta AU - Sara Aghazadehchors AU - Carmen Jiménez AU - Daniel Bellet TI - Spatial Atomic Layer Deposition (SALD), an emerging tool for energy materials. Application to new-generation photovoltaic devices and transparent conductive materials JO - Comptes Rendus. Physique PY - 2017 SP - 391 EP - 400 VL - 18 IS - 7-8 PB - Elsevier DO - 10.1016/j.crhy.2017.09.004 LA - en ID - CRPHYS_2017__18_7-8_391_0 ER -
%0 Journal Article %A David Muñoz-Rojas %A Viet Huong Nguyen %A César Masse de la Huerta %A Sara Aghazadehchors %A Carmen Jiménez %A Daniel Bellet %T Spatial Atomic Layer Deposition (SALD), an emerging tool for energy materials. Application to new-generation photovoltaic devices and transparent conductive materials %J Comptes Rendus. Physique %D 2017 %P 391-400 %V 18 %N 7-8 %I Elsevier %R 10.1016/j.crhy.2017.09.004 %G en %F CRPHYS_2017__18_7-8_391_0
David Muñoz-Rojas; Viet Huong Nguyen; César Masse de la Huerta; Sara Aghazadehchors; Carmen Jiménez; Daniel Bellet. Spatial Atomic Layer Deposition (SALD), an emerging tool for energy materials. Application to new-generation photovoltaic devices and transparent conductive materials. Comptes Rendus. Physique, Volume 18 (2017) no. 7-8, pp. 391-400. doi : 10.1016/j.crhy.2017.09.004. https://comptes-rendus.academie-sciences.fr/physique/articles/10.1016/j.crhy.2017.09.004/
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