THz near-field measurements of metal structures

Aurèle J.L. Adam; Janne M. Brok; Paul C.M. Planken; Min Ah Seo; Dai Sik Kim

doi:10.1016/j.crhy.2007.07.005

THz near-field measurements of metal structures
[Cartographie en champ proche du champ THz diffracté par des structures métalliques]

Aurèle J.L. Adam ¹ ; Janne M. Brok ¹ ; Paul C.M. Planken ¹ ; Min Ah Seo ² ; Dai Sik Kim ²

¹ Delft University of Technology Delft, Department of Imaging Science and Technology, Faculty of Applied Sciences, Lorentzweg 1, 2628 CJ Delft, The Netherlands
² School of Physics, Seoul National University, Seoul 151-747, Republic of Korea

Comptes Rendus. Physique, Recent developments in terahertz optoelectronics, Volume 9 (2008) no. 2, pp. 161-168.

Résumé
Abstract

Nous décrivons des mesures électro-optiques de champs électriques dans le domaine THz dans la région de champ proche de structures métalliques déposées sur des substrats de phosphure de gallium (GaP) électro-optiques. En utilisant des cristaux orientés (110), les composantes x ou y du champ électrique THz sont mesurées tandis que l'orientation cristallographique (001) permet de déterminer la composante z du champ. Ainsi, nous pouvons cartographier le champ avec une résolution spatiale de l'ordre de 20 μm, plus petite de plusieurs ordres de grandeur que les dimensions des structures métalliques. Pour illustrer cette technique et ses performances, nous présentons des résultats concernant le champ mesuré dans un plan situé sous une sphère métallique et sous une feuille métallique comprenant une ouverture carrée. Grâce à une technique d'échantillonnage, ce type de mesures apporte de nombreuses informations sur l'évolution temporelle du champ proche diffracté.

We report on electro-optic measurements of THz electric fields in the near-field of metal structures lying on GaP electro-optic sampling crystals. With (110) oriented crystals, the x or y component of the THz electric field is measured, whereas with a (001) oriented crystal, the z-component is measured. With an estimated spatial resolution of 20 μm, the technique allows us to map the field on a scale, orders of magnitude smaller than the spatial dimensions of these structures. We illustrate the technique by showing results of measurements of the THz electric field in a plane underneath a metal sphere and a single square hole in a metal foil. The technique provides us with a wealth of information on the time-evolution of light fields near metal structures.

Publié le : 2008-01-10

DOI : 10.1016/j.crhy.2007.07.005

Keywords: Terahertz, Near field, Terahertz electric field
Mots-clés : Térahertz, Champ proche, Champ électrique THz

Affiliations des auteurs :

Aurèle J.L. Adam ¹ ; Janne M. Brok ¹ ; Paul C.M. Planken ¹ ; Min Ah Seo ² ; Dai Sik Kim ²

¹ Delft University of Technology Delft, Department of Imaging Science and Technology, Faculty of Applied Sciences, Lorentzweg 1, 2628 CJ Delft, The Netherlands
² School of Physics, Seoul National University, Seoul 151-747, Republic of Korea

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     author = {Aur\`ele J.L. Adam and Janne M. Brok and Paul C.M. Planken and Min Ah Seo and Dai Sik Kim},
     title = {THz near-field measurements of metal structures},
     journal = {Comptes Rendus. Physique},
     pages = {161--168},
     publisher = {Elsevier},
     volume = {9},
     number = {2},
     year = {2008},
     doi = {10.1016/j.crhy.2007.07.005},
     language = {en},
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Aurèle J.L. Adam; Janne M. Brok; Paul C.M. Planken; Min Ah Seo; Dai Sik Kim. THz near-field measurements of metal structures. Comptes Rendus. Physique, Recent developments in terahertz optoelectronics, Volume 9 (2008) no. 2, pp. 161-168. doi : 10.1016/j.crhy.2007.07.005. https://comptes-rendus.academie-sciences.fr/physique/articles/10.1016/j.crhy.2007.07.005/

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