Optical lithography—present and future challenges

Burn J. Lin

doi:10.1016/j.crhy.2006.10.005

Optical lithography—present and future challenges
[Lithographie optique—défis présents et futurs]

Burn J. Lin ¹

¹ TSMC, Ltd., Hsinchu, 300-77 Taiwan, ROC

Comptes Rendus. Physique, Ultimate lithography, Volume 7 (2006) no. 8, pp. 858-874.

Résumé
Abstract

La lithographie optique a été la technologie industrielle par excellence depuis plusieurs décennies. Elle est arrivée jusqu'à une longueur d'onde de 193 nm et une ouverture numérique de 0,93 et elle rencontrait des difficultés pour progresser plus avant jusqu'à l'entrée en lice de la lithographie en immersion. Cet article traite des limites des systèmes de lithographie sèche et en immersion, des défis présents et futurs pour pousser à l'extrême limite cette technique. Est incluse une discussion sur les défauts en lithographie par immersion, le point sur cette lithographie en immersion, l'illumination polarisée, les matériaux à fort indice de réfraction, les masques à immersion solide, la double exposition et la double impression.

Optical lithography has been an industrial workhorse for many decades. It has reached a wavelength of 193 nm, a Numerical Aperture (NA) of 0.93 but was facing difficulties to advance further until the debut of immersion lithography. This review deals with the limit of dry and immersion lithography systems, their present and future challenges to reach these very limits. A discussion of defects in immersion lithography, the status of immersion lithography, polarized illumination, high-index materials, solid-immersion mask, double exposure and double patterning is included.

Publié le : 2006-10-01

DOI : 10.1016/j.crhy.2006.10.005

Keywords: Microlithography, Optical lithography, Immersion lithography
Mots-clés : Microlithographie, Lithographie optique, Lithographie en immersion

Affiliations des auteurs :

Burn J. Lin ¹

¹ TSMC, Ltd., Hsinchu, 300-77 Taiwan, ROC

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Burn J. Lin. Optical lithography—present and future challenges. Comptes Rendus. Physique, Ultimate lithography, Volume 7 (2006) no. 8, pp. 858-874. doi : 10.1016/j.crhy.2006.10.005. https://comptes-rendus.academie-sciences.fr/physique/articles/10.1016/j.crhy.2006.10.005/

Bibliographie
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